Magnetic sputter target - Diana de pulverización catódica magnética

Magnetic sputter target - Diana de pulverización catódica magnética

Flange: ICF70, ICF114, ICF152
Target size: 1-5 inch
RF power supply: 200-1000W
Water cooling

Sputter picture

Distance between target and substrate

(mm)

Material

Ar pressure

(pa)

RF power

(W)

Film growth

(mm/min)

200 Cu 4 150 12

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Magnetron sputter target MST-ICF114 - DN-63CF

Magnetron sputter target MST-ICF114 - DN-63CF

Contactar para el precio: +39 0342 803365

Magnetron sputter target MST-ICF152 - DN-100CF

Magnetron sputter target MST-ICF152 - DN-100CF

Contactar para el precio: +39 0342 803365